Exploring FeFET Degradation Mechanisms: Mid-Interlayer as a Viable Solution for Stable Retention, Disturb Immunity, and Low Vth Variation
- Year
- 2025
- Author
- Giuk Kim, Sangho Lee, Hyojun Choi, Hoon Kim, Seokjoong Shin, Sanghyun Park , Kwangyou Seo, Kwangsoo Kim, Wanki Kim, Daewon Ha, Jinho Ahn, Sanghun Jeon
- Conference
- 2025 Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)
- Status
- Accepted
- Vol
- 2025
