목록 게시판 리스트 옵션 검색 Method of fabricating gate dielectric for use in semiconductor device Year of publication Before~2005 Inventor 황현상,전상훈 Application No. KR1020000065830A Application date Registration No. KR100359489B1 Registration date Link https://patents.google.com/patent/KR100359489B1/en?oq=10-0359489 739회 연결