Semiconductor device having a gate contact structure capable of reducing interfacial resistance and method of forming the same
- Year of publication
- 2010
- Inventor
- Chang-seok Kang, Yoo-Cheol Shin, Jung-Dal Choi, Jong-Sun Sel, Ju-Hyung Kim, Sang-Hun Jeon
- Application No.
- 11797401
- Application date
- Registration No.
- US7776687B2
- Registration date
- Link
- https://patents.google.com/patent/US7776687B2/en 474회 연결
