Low-Temperature (450 ∘C) Crystallization of Al:HfO2 Ferroelectric Thin Films Enabled by Microwave Annealing Process

Author

Giuk Kim, Lingwei Zhang, Sangho Lee, Hunbeom Shin, Youngjin Lim, Kang Kim, Il-Kwon Oh, Sang-Hee Ko Park, Jinho Ahn, Sanghun Jeon

Journal

IEEE Transactions on Electron Devices

Year

2025

Link

http://10.1109/TED.2025.3599825 735회 연결