HZO (> 10 nm) Films for Achieving High-k Near Morphotropic Phase Boundary at Low-Temperature Furnace Annealing Process

Author

Yixin Qin, Venkateswarlu Gaddam, Taeseung Jung, Sanghun Jeon

Journal

IEEE Transactions on Electron Devices

Status

Accepted

Year

2024

Link

https://ieeexplore.ieee.org/abstract/document/10597140 1097회 연결