High Pressure Microwave Annealing Effect on Electrical Properties of HfxZr1–xO Films near Morphotropic Phase Boundary

Author

Minhyun Jung, Chaeheon Kim, Junghyeon Hwang, Giuk Kim, Hunbeom Shin, Venkateswarlu Gaddam, and Sanghun Jeon

Journal

ACS Applied Electronic Materials

Status

Accepted

Vol

5, 9

Page

4826-4835

Year

2023

Link

https://doi.org/10.1021/acsaelm.3c00623 1065회 연결