Insertion of HfO2 Seed/Dielectric Layer to the Ferroelectric HZO Films for Heightened Remanent Polarization in MFM Capacitors

Author

Vekateswarlu Gaddam, Dipjyoti Das, Sanghun Jeon

Journal

IEEE Transactions on Electron Devices

Vol

67

Page

745-750

Year

2020

Link

https://ieeexplore.ieee.org/abstract/document/8962183 1097회 연결