Evolution of crystallographic structure and ferroelectricity of Hf0. 5Zr0. 5O2 films with different deposition rate

Author

Taeho Kim, Minho An, Sanghun Jeon

Journal

AIP Advances

Vol

10

Page

015104

Year

2020

Link

https://aip.scitation.org/doi/10.1063%2F1.5121454 1044회 연결