Comprehensive study of high pressure annealing on the ferroelectric properties of Hf0. 5Zr0. 5O2 thin films

Author

Changyong Oh, Amit Tewari, Kyungkwan Kim, Ulayil Sajesh Kumar, Changhwan Shin, Minho Ahn, Sanghun Jeon

Journal

Nanotechnology

Vol

30

Page

505204

Year

2019

Link

https://iopscience.iop.org/article/10.1088/1361-6528/ab3c8f/meta 1357회 연결