Effects of high pressure nitrogen annealing on ferroelectric Hf0.5Zr0.5O2 films

Author

Taeho Kim, Jinsung Park, Byoung-Ho Cheong, Sanghun Jeon

Journal

Applied Physics Letters

Vol

112

Page

092906

Year

2018

Link

https://aip.scitation.org/doi/full/10.1063/1.5003369 732회 연결