Ferroelectricity Enhancement in Hf0.5Zr0.5O2 Based Tri-Layer Capacitors at Low-Temperature (350 °C) Annealing Process

Author

Venkateswarlu Gaddam, Dipjyoti Das, Taeseung Jung, Sanghun Jeon

Journal

IEEE Electron Device Letters

Vol

42

Page

812-815

Year

2021

Link

https://ieeexplore.ieee.org/abstract/document/9410571 1287회 연결