Ferroelectricity in Al₂O₃/Hf0.5Zr0.5O₂ Bilayer Stack: Role of Dielectric Layer Thickness and Annealing Temperature

Author

Dipjyoti Das, Venkateswarlu Gaddam, Sanghun Jeon

Journal

JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE

Vol

21

Page

62-67

Year

2021

Link

https://doi.org/10.5573/JSTS.2021.21.1.062 844회 연결