Novel Approach to High κ (∼59) and Low EOT (∼3.8 Å) near the Morphotrophic Phase Boundary with AFE/FE (ZrO2/HZO) Bilayer Heterostructures and High-Pressure Annealing

Author

Venkateswarlu Gaddam, Giuk Kim, Taeho Kim, Minhyun Jung, Chaeheon Kim, and Sanghun Jeon

Journal

ACS Applied Materials & Interfaces

Status

Accepted

Year

2022

Link

http://doi.org/10.1021/acsami.2c08691 1050회 연결