Unlocking the Potential of Hafnia Ferroelectrics: Achieving High Reliability via Plasma Frequency Modulation in Very HighFrequency Plasma-Enhanced Atomic Layer Deposition

Author

Ketong Yang, Minhyun Jung, Taeseung Jung, Jae Seok Yoon, Junghyeon Hwang, Hunbeom Shin, Seungyeob Kim, Chaeheon Kim, and Sanghun Jeon

Journal

ACS Applied Electronic Materials

Status

Accepted

Year

2024

Link

http://doi.org/10.1021/acsaelm.4c00630 706회 연결