목록 Achieving Morphotropic Phase Boundary at Extremely Low-Temperature (200 ∘C) in HZO (>10 nm) Films Using Microwave Annealing Author Taeseung Jung, Hunbeom Shin, Jinho Ahn, Sanghun Jeon Journal IEEE Transactions on Electron Devices Status Accepted Year 2025 Link http://10.1109/TED.2025.3560925 814회 연결