목록 게시판 리스트 옵션 검색 Completed Low-temperature hafnia ferroelectric process development and TFT integration research for functional TFT 본문 Period: 2019-07-01 ~ 2020-06-30 Sponsor: LG Display 이전글Low Temperature Process (<550°C) Hafnia Ferroelectric Tunnel Junction for Non-Volatile Logic 다음글Hybrid multifunctional sensor for wearable device application